The Pfeiffer Vacuum DPG 202 is a compact yet powerful control and display unit, specifically designed to bridge the gap between complex digital vacuum measurement and industrial process automation. As part of the Fab Solutions lineup, the DPG 202 is optimized for integration into control panels where precise monitoring and automated pressure regulation are critical.

Intelligent DigiLine Integration

The DPG 202 is purpose-built to operate with Pfeiffer’s DigiLine series of digital transmitters. By utilizing a robust RS-485 interface, the controller can communicate digitally with sensors, ensuring noise-free data transmission over long distances. The unit automatically recognizes the connected DigiLine gauge and scales the measurement range accordingly, covering everything from rough vacuum to ultra-high vacuum ($10^{-11}$ mbar) depending on the attached probe.

Advanced PID and Switching Logic

Beyond simple display, the DPG 202 features a sophisticated PID control algorithm. This allows the device to manage automated tasks, such as maintaining a specific partial pressure in a vacuum chamber by controlling a leakage valve or a mass flow controller. Additionally, the unit includes two independent setpoint relays. These can be programmed to trigger external hardware—such as vacuum pumps, safety valves, or warning lights—when specific pressure thresholds are met.

Key Features

• High-Visibility LCD: Displays pressure readings in scientific notation with clear unit indicators (mbar, Torr, Pa).
• Ease of Configuration: Parameters for PID control and setpoints can be set directly via the front keypad or remotely via the RS-485 interface.
• Compact Industrial Design: Standard panel-mount dimensions (96 x 48 mm) allow for easy installation in standard racks and control cabinets.
• Status Monitoring: Real-time display of relay states and diagnostic messages for the connected sensor.
• 24V DC Operation: Standard industrial power supply compatibility for easy integration into existing control loops.

Typical Applications

• Semiconductor Fabrication: Precise monitoring and control of load locks and processing chambers.
• Analytical Instrumentation: Vacuum management for mass spectrometers and electron microscopes.
• Industrial Coating: Maintaining constant pressure during sputter deposition or chemical vapor deposition (CVD) processes.
• Research and Development: Centralized control terminal for complex UHV (Ultra-High Vacuum) experimental setups.